Inductively Coupled Plasma Atomic Emission Spectrometer (ICP-OES)

Trade name
ICP-OES Plasma Quant 9100 spectrometer with accessories
Technical description

The PlasmaQuant 9100 Elite (Analytik Jena) is a high-resolution ICP-OES emission spectrometer used in our laboratory for rapid, multi-element analysis of samples of varying complexity. The instrument utilizes High-Resolution Echelle optics with a wavelength range of 160–900 nm and a resolution of 0.002 nm, enabling efficient resolution of dense spectral lines and reducing spectral interference. Low-light-loss optics ensure high sensitivity, stability, and the ability to determine both trace and high-concentration elements. The integrated Dual View PLUS system enables simultaneous plasma observation in axial and radial modes, allowing for the combination of ultratrace analysis and percent concentration determinations within a single method. The vertical ICP torch position in the V Shuttle Torch system increases resistance to complex matrices and improves plasma stability, while the water-cooled, argon-purged cone ensures low background levels and high sensitivity, especially in axial observation. The Peltier-cooled CCD detector ensures low noise and wide signal dynamics, while automatic integration time adjustment enables simultaneous determination of trace and high-concentration elements. The short aerosol path ensures rapid rinsing and highly reproducible sample delivery. Thanks to the combination of high-resolution optics, an advanced plasma observation system, and a stable vertical ICP torch, the PlasmaQuant 9100 Elite enables precise, sensitive, and repeatable determinations even in challenging matrices, while ensuring high throughput and reliability for everyday analysis.

Conditions for providing infrastructure

Under contracts and orders after prior approval by the Laboratory Manager.

Type of accreditation / certificate:
Not applicable
Access type
External
Research capabilities

The spectrometer enables quick and extremely precise determination of elements in materials, raw materials and industrial samples.

Last update date
Nov. 24, 2025, 2:45 p.m.
Year of commissioning
2025
Measurement capabilities

Thanks to its high optical resolution, resistance to difficult matrices and wide detection range, it provides results that cannot be obtained with standard systems.

Photos
ICP-OES
ICP-OES