Magnetron sputtering system Leica EM ACE600

Trade name
Leica EM ACE600
Technical description

High vacuum magnetron sputtering system Lecia EM ACE600 for deposition of thin films from two independent metal target sources. The sputtering system contains:

  • inner, integrated oil-free diaphragm pump and turbomolecular pump,
  • two independent integrated magnetrons for metal-based targets,
  • automated substrate table with controllable height, rotation and sputtering angle,
  • quartz-crystal balance for layer thickness determination.
Conditions for providing infrastructure

Equipment made available on the terms applicable from the Regulations for the Use of ACMiN Research Infrastructure. (

Type of accreditation / certificate:
Not applicable
Access type
Research capabilities

Metallic thin films deposition

Last update date
Nov. 10, 2023, 12:44 p.m.
Year of commissioning