Etching and layering system with accessories

Trade name
Etching and layering system with accessories
Technical description

Vacuum chamber with DC and RF magnetrons and KDC40 ion source

Conditions for providing infrastructure

Determined individually

Type of accreditation / certificate:
Not applicable
Access type
External
Research capabilities

Deposition of thin metallic and dielectric layers. Ion etching of metallic and dielectric layers

Last update date
Aug. 21, 2023, 11:35 a.m.
Year of commissioning
2021
Measurement capabilities

lack

Photos
etching machine
etching machine
etching machine
etching machine
etching machine
etching machine