Etching and layering system with accessories
Trade name
Etching and layering system with accessories
Technical description
Vacuum chamber with DC and RF magnetrons and KDC40 ion source
Conditions for providing infrastructure
Determined individually
Type of accreditation / certificate:
Not applicable
Access type
External
Research capabilities
Deposition of thin metallic and dielectric layers. Ion etching of metallic and dielectric layers
Last update date
Aug. 21, 2023, 11:35 a.m.
Year of commissioning
2021
Measurement capabilities
lack
Photos

etching machine

etching machine

etching machine

Responsible body