X-ray Photoelectron Spectroscopy

Trade name
PHI 5000 XPS VersaProbeII
Technical description

The spectrometer of photoelectrons emitted under the influence of irradiation with X-ray (XPS) or ultraviolet (UPS) radiation is used to analyze the composition and chemical states of elements on the surface of the tested material. The laboratory is equipped with an XPS/UPS photoelectron spectrometer model PHI 5000 VersaProbeII (ULVAC-PHI, Chigasaki, Japan). This device is equipped with a hemispherical electron energy analyzer with high energy resolution and a sensitive, microchannel detector (channel plate). It acquires photoelectrons emitted by a monochromatic X-ray source (Al Kα 1486.6 eV) or a source of ultraviolet radiation (He I 21.2 eV, He II 40.8 eV). The spectrometer is equipped with an ion gun which enables depth profiling with argon clusters with sizes in the range of 1000 - 5000 atoms/cluster accelerated with energies of 5-20 keV (Argon Gas Cluster Ion Beam - Ar-GCIB). In addition, the second ion gun allows sputtering with a beam of mono-atomic argon ions with a maximum energy of 5 keV. During the analysis, the material can be cooled or heated in the range from -120oC to 500oC. The five-axis manipulator enables analysis depending on the angle of the sample position relative to the axis of the analyzer (AR-XPS) and conducting ion sputtering on a rotating sample (Zalar rotation).

Conditions for providing infrastructure

Equipment is available in accordance with the Regulations for the Use of ACMiN's Research Infrastructure. (https://acmin.agh.edu.pl/acmin/dokumenty/)

Type of accreditation / certificate:
Not applicable
Access type
Research capabilities
  • quantitative analysis of the chemical composition and determination of the chemical state of elements in the surface layer within a thickness of approx. 5 nm
  • determination of the concentration of elements along with the identification of their chemical state relative to depth (depth profiling) with a minimum resolving power relative to the depth of 10 nm
Last update date
Aug. 30, 2023, 1:16 p.m.
Year of commissioning
X-ray Photoelectron Spectrometer
X-ray Photoelectron Spectrometer