Ion etching and layer deposition system

Trade name
Microsystems IonSys 500
Technical description

The Class 1000 clean room houses the Microsystems IonSys 500 ion etching and thin film deposition device. The system is equipped with an ion gun along with a SIMS detector, which enables the etching of thin films with nanometer precision, and a magnetron sputtering source. The room also houses a contact profilometer (Bruker DektakXT) for measuring the thickness and roughness of the fabricated nanostructures and deposited layers.

Conditions for providing infrastructure

Equipment is available in accordance with the Regulations for the Use of ACMiN's Research Infrastructure. (

Type of accreditation / certificate:
Not applicable
Access type
Research capabilities

The apparatus allows the deposition of thin layers of materials such as titanium, gold, aluminum or aluminum oxide, with etching by an ion gun. Combined with any lithography, this makes it possible to obtain atomic layers for modern research such as: spintronics, superconductivity or spin calorimetry. The layers are deposited at high vacuum (HV), at a pressure of about 1 x 10-7 mbar. The maximum sample size for etching and layer application is a wafer of 6, or a 4-inch by 4-inch.

Last update date
Nov. 10, 2023, 12:38 p.m.
Year of commissioning
Thin film deposition and ion etching system
Thin film deposition and ion etching system