High-resolution electron beam lithography system

Trade name
eLINE Plus Basic - SN.: 1-212-233
Technical description

The Class 100 clean room houses the electron lithography unit (Raith eLine+). The system consists of an electron gun, a secondary electron detector, an in-lens detector, a laser interferometer, control electronics, and a pump system to maintain adequate vacuum in the device. The system is capable of irradiating elements ranging in size from 10 nm to several hundred µm on a sample surface of up to 4 inches.

In addition, the room includes a process table (Arias) for applying, ,baking and removing the resist. In the table, we have positioned a heating plate, an ultrasonic cleaner, a centrifuge, a nitrogen gun, and a distilled water gun for washing samples. Necessary utilities such as water, gas, and an extractor are located in the tabletop, which continuously discharges chemical vapors.

Electron lithography is performed using AR-P 617 series positive resist, while negative lithography is based on AR-N 7520 series resist.

Conditions for providing infrastructure

Equipment is available in accordance with the Regulations for the Use of ACMiN's Research Infrastructure. (https://acmin.agh.edu.pl/acmin/dokumenty/)

Type of accreditation / certificate:
Not applicable
Access type
Research capabilities

Users are able to perform accurate nanostructuring at the described resolution. The entire process takes place in a clean room, which benefits the quality of the samples obtained. Combined with the close proximity of the pulsed laser ablation laboratory, it is possible to obtain complete interfaces with the potential for application in scientific fields such as spintronics.

Last update date
Nov. 10, 2023, 12:41 p.m.
Year of commissioning
Raith eLine+ electron lithography system
Raith eLine+ electron lithography system
MicroWriter ML3 optical lithography system
MicroWriter ML3 optical lithography system
ARIAS processing table
ARIAS processing table