Equipment
Pulsed Laser Deposition System
Contact person:
Jabłoński Piotr
Technical description:
The system allows the fabrication of thin films of a specified stoichiometric or supersaturated composition with thicknesses ranging from a few nanometers to a few micrometers, on a variety of substrates (metallic, ceramic, polymeric). Substrates ca…
High-resolution electron beam lithography system
Contact person:
Jabłoński Piotr
Technical description:
The Class 100 clean room houses the electron lithography unit (Raith eLine+). The system consists of an electron gun, a secondary electron detector, an in-lens detector, a laser interferometer, control electronics, and a pump system to maintain adeq…
