Equipment
DC magnetron vacuum sputtering system
Contact person:
Kryshtal Oleksandr
Technical description:
Simple and functional sputter deposition unit for reproducible thin film layers applying. Optimized for co-deposition of TEM specimens. Main parameters: - Base pressure range 10-7 mbar - Process chamber diameter: Ø 355 mm - Substrate stage fo…
Vacuum system for thin films sputtering and nanoparticles deposition
Contact person:
Jabłoński Piotr
Technical description:
The deposition system consists of two vacuum chambers made by Mantis, which fulfil the conditions of high vacuum (HV). The first chamber enables the deposition of metal or metal oxide nanoparticles by means of the Inert Gas Condensation (IGC) method…
