Equipment
Photoelectric spectrometer
Contact person:
Podborska Agnieszka
Technical description:
The measuring system consists of a digitally controlled light source (XBO150 xenon lamp, monochromator, set of edge filters, shutter, light intensity stabilization system), a calibrated photodiode, a dedicated potentiostat and a Kelvin probe with a …
Vacuum system for thin films sputtering and nanoparticles deposition
Contact person:
Kollbek Kamila
Technical description:
The deposition system consists of two vacuum chambers made by Mantis, which fulfil the conditions of high vacuum (HV). The first chamber enables the deposition of metal or metal oxide nanoparticles by means of the Inert Gas Condensation (IGC) method…
X-RAY Diffractometer with HT chamber
Contact person:
Marciszko-Wiąckowska Marianna
Technical description:
Panalytical Empyrean Powder Diffractometer with Co Lamp It allows to carry out measurements in the geometry of the Bragg-Brentano beam with the use of collimating slits and in the geometry of the parallel beam (Goebel mirror). They are equipped with…
X-RAY Diffractometer with SAXS/WAXS
Contact person:
Marciszko-Wiąckowska Marianna
Technical description:
Panalytical Empyrean powder diffractometers with Cu lamp. It allows to carry out measurements in the geometry of the Bragg-Brentano beam with the use of collimating slits and in the geometry of the parallel beam (Goebel mirror). Diffractometer equip…
Argon ion milling system for samples flat milling or cross-section preparation
Contact person:
Tokarski Tomasz
Technical description:
The ion polisher is a device used for precision polishing of flat surfaces as well as for cross-sectioning metallic, ceramic and polymer materials. The device is capable to work with samples up to 50 mm in diameter at ion energies up to 6 keV. It is…
Single crystal growing furnaces (Bridgman method)
Contact person:
Tokarski Tomasz
Technical description:
Single crystals growing devices using Bridgman technique. Resistance heaters are capable of achieving temperatures up to 1100°C allowing for controlled crystallisation of the pure metals and alloys within specified temperature range. Going from …
Wire electrical discharge machine (W-EDM)
Contact person:
Tokarski Tomasz
Technical description:
CNC machine for cutting of conducting materials using wire. it allows for precise cutting of complicated shapes defined by the G-CODE. Cutting is made in deionised water.
Furnace up to 1300°C
Entity:
Zakład Inżynierii Materiałowej
Contact person:
Cios Grzegorz
Technical description:
Resistive furnace, no inert atmosphere, no vacuum chamber.
Ion etching and layer deposition system
Contact person:
Graboś Adrian
Technical description:
The Class 1000 clean room houses the Microsystems IonSys 500 ion etching and thin film deposition device. The system is equipped with an ion gun along with a SIMS detector, which enables the etching of thin films with nanometer precision, and a magn…
Profilometer for measuring nanometer-sized layers
Contact person:
Graboś Adrian
Technical description:
Contact needle profilometer for testing surface roughness and waviness with a resolution of 1 A and a repeatability of 4 A≤ (angstrom).
