Equipment
High-resolution electron beam lithography system
Contact person:
Jurzecka-Szymacha Maria
Technical description:
The Class 100 clean room houses the electron lithography unit (Raith eLine+). The system consists of an electron gun, a secondary electron detector, an in-lens detector, a laser interferometer, control electronics, and a pump system to maintain adeq…
Metallographical microscope (clean room) Nikon Eclipse LV150N
Contact person:
Jurzecka-Szymacha Maria
Technical description:
The light microscope (LM) allows imaging in reflected light in bright field (BF), dark field (DF), polarised light (POL) and reflected light. field (BF). It has a fully motorized stage (X,Y,Z), allowing automatic taking pictures in extended depth of…
Profilometer for measuring nanometer-sized layers
Contact person:
Jurzecka-Szymacha Maria
Technical description:
Contact needle profilometer for testing surface roughness and waviness with a resolution of 1 A and a repeatability of 4 A≤ (angstrom).
Ion etching and layer deposition system
Contact person:
Jurzecka-Szymacha Maria
Technical description:
The Class 1000 clean room houses the Microsystems IonSys 500 ion etching and thin film deposition device. The system is equipped with an ion gun along with a SIMS detector, which enables the etching of thin films with nanometer precision, and a magn…