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Linear X-ray scanner

Contact person: Dąbrowski Karol
Technical description: The apparatus mainly comprises a thick stainless steel, radiation-isolating enclosure, a computer controlled X-ray generator allowing the user adjust the X-ray intensity, an X-ray transparent core holder, and below it, a linear X-ray detector to mea…

IFT Cell 1000

Contact person: Dąbrowski Karol
Technical description: High-pressure research cell  CE Certification for pressurized vessel following PED 2014/68/EU by registered authorities. Measurements to 1000 bar and 200 °C. Rotating System for Contact Angle Measurement between liquid and rock sample (rock…

Atomic absorption spectrometer AAS

Contact person: Bajda Tomasz
Technical description: AAS atomic absorption spectrometer for chemical composition analyses of solutions - elements from Li to U. The spectrometer has features such as a programmable gas box, eight tubes with automatic tube settings, wavelength and slit width optimisat…

IBIS-L/S ground-based interferometric radar

Contact person: Kuras Przemysław
Technical description: The IBIS-L/S ground-based interferometric radar is a precise microwave measuring device used for remote, non-contact measurement of displacements and deformations of building structures and land surfaces with high accuracy. The main element of the s…

Nanohardness Tester NHT 50-183; Nano-Scrach Tester NST 50-146

Technical description: Nanohardness Tester: The device is used to measure the hardness of materials with a fine-crystalline structure, thin layers. Performing single and cyclic measurements. Possibility of applying loads from 0.05 mN to 500 mN. Equipped with a Berkovich i…

Ion Milling

Technical description: Penning-type Ar ion gun, operating at a voltage in the range from 0kV to 6kV Ability to observe the sample during the polishing and cutting process using a stereoscope Sample polishing range: diameter 50 mm, height 25 mm Flat miling mode: -maximum s…

Scanning electron microscopy Nova Nano SEM 450

Technical description: Source NSFEG with ultra-high brightness Schottky field emitter, High and low vacuum analysis Resolution high-vacuum imaging, optimum working distance - 0.8 nm at 30 kV (STEM) - 1.0 nm at 15 kV (TLD-SE) - 1.4 nm at 1 kV (TLD–SE without beam dec…

Scanning electron microscopy INSPECT S50

Technical description: Source Tungsten hairpin filament, which is mounted within tetrode gun assembly Voltage 200 V to 30 kV Beam Current Up to 2 μA Resolution (measured as particle separation on a carbon substrate) High-vacuum mode: - 3.0 nm at 30 kV (SED) - 10.0 nm a…

Differential Scanning Calorimetry (DSC)

Technical description: DSC type Double-furnace design Measurement principle Power-compensation Furnace material 90% platinum alloy Temperature sensors Distributed, platinum resistance thermometers Range -180 ˚C to 750 ˚C Accuracy ±0.05 ˚C Precision ±0.008 ˚C…

Scanning Probe Microscope

Contact person: Cieniek Łukasz
Technical description: Operating modes: AFM – Atomic Force Microscopy LFM – Lateral Force Microscopy MFM – Magnetic Force Microscopy EFM – Electric Force Microscopy PFQNM - PeakForce Quantitative Nano-Mechanical Mapping Area of analysis XY from max…